Strathmore and UoN to benefit from Intel’s software developer programme

Agatha Gikunda, Lead Intel Software and Services Group EA, with students
Agatha Gikunda, Lead Intel Software and Services Group EA, with students

Intel Corporation has announced a collaboration program that will see University of Nairobi and Strathmore University students benefit from software developer program.


The company will provide resources in the universities’ hardware labs, build a student Developer Partner Program and integrate High Performance Computing into the university curriculum.


These activities are aimed at enhancing the ability of student developers to create rich user experience on Intel-based hardware as well as test their software applications.


The announcement was made at Strathmore last week, during a developers’ conference hosted by Intel that saw more than 250 developers in attendance. Intel aims to reach over 400 developers and having 100 new applications created locally that will offer users differentiated experiences across mobile phones and tablets running on Intel Architecture.


“Intel Software and Services Group seeks to enhance local innovation and provide tools to developers that enable them create applications with rich user experience on devices running on Intel technology. We are very excited about the growing developer engagement in Africa and seek to increase collaborations with tech hubs, independent software vendors and universities,” said Danie Steyn, East Africa General Manager.


The collaboration with the two universities is part of a greater initiative by Intel’s Software and Services Group that will also reach out to developers and tech entrepreneurs in Kenya – the first such program in Africa. Intel and iHub will on a quarterly basis host intensive coaching sessions for developers dubbed Ideation Camps that seek to empower upcoming tech entrepreneurs and social innovators with tools to turn complex problems into great business opportunities.




Leave a Reply

Your email address will not be published. Required fields are marked *